Systematic design of millisecond gasification reactor for the incorporation of gas-sieving nanopores in single-layer graphene

Etching an ensemble of vacancy defects (nanopores) in single-layer graphene (SLG) to obtain a high density nanopores with effective size that enables high-performance gas sieving is challenging. This because nanopore nucleation and expansion are usually coupled. Aggressive etching conditions promote defect difficult control for limiting the pore expansion. To address this, we recently reported millisecond gasification reactor (MGR) allows aggressive at same time restricts few milliseconds. Herein, systematically analyze various components MGR setup achieve optimal based on mathematical model simulating etchant exposure profile MGR. We study effect such as baseline pressure, peak time, formation SLG via Raman spectroscopy. Nanopores formed different temperatures observed by scanning tunneling microscope, revealing relationship between temperature density. The incorporation under optimized realization extremely attractive CO 2 -sieving performances from nanoporous (NSLG) membranes, marked permeance 900–4000 permeation units (GPU) /N selectivity 17–25. establishes highly tunable tool incorporating desired number important molecular separations. • Optimization novel regime incorporate gas-sieving graphene. Study parameters controlling reaction STM. Pore promoted higher pressure temperature. Etchant pulse residence (FWHM = 0.3 s) restrict GPU 17–23.